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marcuskala's avatar
9 years ago

dengar raid team - tenacity down explained

currently working on dengy, any predictions on how i will fare with teebo, qui-gon, chewie, phasma, dengar on T7? Will Dengar be worth it for raids or better off with elder/scout/someone else?

Edit: dev update: tenacity down means that regardless of potency/tenacity there will be the minimum of 15% chance of resist.

7 Replies

  • 77% with a scanner isn't too bad, his tenacity down procs 100% which is a bug i think but we don't even know if it actually affects tenacity at all. Vs rancor we can just retreat for RNG too
  • I'm thinking it shouldn't be too bad at max it's 77%. Teebo at max is 80% so not a lot of difference and if the tenacity down works the potency is effectively increased by default...
  • "giggsy;530206" wrote:
    I'd even drop phasma for ewok scout or elder. Dengar can give the speed down. Theoretically his low potency doesn't matter because you can always just reset early on if tenacity down doesn't land. After it does its gg


    i was thinking this - together to ensure always speed down or maybe dengar can just do it enough alone. only 50% dance, but for 3 turns is pretty big actually
  • actually i think we just got devs word on this - apparently it lowers chance of resist to the minimum of 15% regardless of potency/tenacity. do toons with huge potency vs low tenacity usually get resisted 15%?

    https://forums.galaxy-of-heroes.starwars.ea.com/discussion/50708/tenacity-down-negative-status-effects-still-getting-resisted#latest
  • My testing seems to indicate that level difference has a role in the min resist formula as well. 15% seems about right vs same level enemies. However the resist rate seems to go up when the attacker is lower level that the target. This is relevant since the heroic rancor is level 90.
  • "mccif16;530516" wrote:
    Use kit for potency up


    Unfortunately that won't make any difference. The added potency will not overcome the base resist. The tenacity-potency relationship looks to be independent of the base resist which may be level difference dependent.