OK, I am a bit confused.
Previous proposed change is: Each time they damage an Exposed enemy, all Resistance allies gain 3% Turn Meter and the target enemy loses 5% Turn Meter for each Resistance ally.
Current proposed change is: If an enemy is damaged by a Resistance ally, for each Expose on them: That enemy loses 5% Turn Meter for each Resistance ally, all Resistance allies gain 3% Turn Meter for each Resistance ally.
Doesn't the new one cause more TM removal and TM gain (now based on the number of expose) ??? How would this prevent HSith P1 loop that they mentioned earlier?
